Microelectronics Water Treatment

ULTRAPURE WATER-Micro 2011 is a two-day conference on Microelectronics Pure Water. The conference consists of state-of-the-art technical papers and Table-Top exhibits. Preliminary details of the 2011 conference and registration form will be available soon. Click here for a Tabletop Reservation form.

Final Program:


Moderators: Slava Libman, Ph.D., Air Liquide Balazs; and Rich Riley, Intel

Wednesday, November 2
Morning Session: UPW Roadmap, Microelectronics Industry Needs/Risks
9:00 AM—Session Introduction
9:15 AM—ITRS Update
Slava Libman, Ph.D., Air Liquide Balazs
9:45 AM—SEMI Filter Performance Validation Task Force Report
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.;
10:45 AM—Organic Contamination in UPW
Dan Wilcox, Spansion Inc.
11:15 AM—Analytical Methods and Data of Organics Speciation in Ultrapure Water
Hugh Gotts and Slava Libman, Ph.D., Air Liquide Balazs, Stefan Huber, DOC-Labor

Afternoon Session: Technology Development/Optimization
1:15 PM—Effect of Polish Ion Exchange Resin Selection to UPW System Performance
Alan Knapp, Siemens; and Slava Libman, Ph.D., Air Liquide Balazs
1:45 PM—Reverse Osmosis Design Best Practices for UPW Make-Up
Jane Kucera, Nalco
2:15 PM—Trace Urea Removal Technology for Ultrapure Water Quality Improvement
Nobukazu Arai, Shigeki Fujishima, Taro Iizumi, and Ikunori Yokoi, Kurita Water Industries Ltd.
3:15 PM—Minimizing Particle and Metal Ion Contamination for Discrete Components
Edward Cellucci and Greg Michalchuk, Plast-O-Matic Valves Inc.
3:45 PM—Suspension-Polymerized PVDF: Effects of Steam and Ozone Sterilization on Pipes and Fittings Joined by Infrared and Electrofusion Welding
Trevor Spence, Solvay Solexis

4:15 PM--ITRS Discussion
5:00-6:30 PM—Reception in Exhibits Area

Thursday, November 3
Morning Session: Metrology, Analytical Methods
8:45 AM--UPW Water Business Opportunities in Microelectronics/Photovoltaics
David McBain, Veolia Water Solutions & Technologies
9:15 AM—Digital Sensor Technology Advances Resistivity Measurement Accuracy
David Gray, Anthony Bevilacqua, Ph.D., and James Cannon, Mettler-Toledo Thornton
9:45 AM—The Effect of Particle Composition on Filter Removal of Sub-30-nm particles from UPW
Don Grant, CT Associates
10:30 AM—Monitoring and Controlling UPW Organic Nitrogen Contamination to Improve Immersion Photolithography Process Control
Richard Godec, GE Instruments
11:00 AM—New Developments in Measuring TOC in Semiconductor Applications
Roger Schmid, SWAN Analytical
11:30 AM—New Automation and Monitoring Technology to Improve Operation of Membrane Installations
Danny Blagojevich, Barry Carroll, Anders Hallsby, and Brian Jenkins, Nalco Co.

Afternoon Session: Water Management (Conservation)
1:00 PM—Preventing the Release of Nano Materials from Depleting Ion Exchange Beds by Using an On-line Boron Analyzer
Richard Godec, GE Instruments
1:30 PM—Benefits of Regular UPW Operational Data and Trend Review
Brad Herbert, ON Semiconductor; John Morgan, H2Morgan
2:00 PM—Strategic Development and Implementation of Sustainable Water Management Programs for High Volume Manufacturing Using Ultrapure Water
Ralph Williams, James Lozier, and Kyle Poole, CH2M Hill
2:30 PM—Black and Gold and Green: A Progress Report on UPW Recovery at Purdue University’s Birck Nanotechnology Center
Tim Miller, Purdue University
3:00 PM—Economics Benefits of Processing RO Reject with Additional RO for Additional Water Recovery
Brad Herbert, ON Semiconductor; Alan Knapp, Siemens; John Morgan, H2Morgan; Wayne Bates, Hydranautics

3:30 PM­-Detecting 25-nm Particles in DI Water
Bill Shade, Lighthouse Worldwide Solutions

Register Now:

Click here for a paper registration form.  Or, Click here to register on-line.


TABLETOP EXHIBITS

Exhibit hours: Wednesday: 1:00 PM-6:30 PM; Thursday: 9:00 AM–3:00 PM.
Click Here for 2011 Exhibitor's Prospectus