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ULTRAPURE WATERUltrapure Water-
Micro 2010
Conference

Conference on Electronics Water
November 16-17, 2010 
Hilton Hotel, Mesa (Phoenix), Arizona

 

ULTRAPURE WATER--Micro is a two-day conference on Microelectronics Pure Water offering an Executive Forum consisting of state-of-the-art technical papers and Table-Top exhibits.  Typical attendance is 130 individuals, mostly from the microelectronics industries.  Click Here for a registration form, or register online at: www.ultrapurewater.com/Zencart.
 
Proceedings of past conferences are available for purchase at: www.talloaks.com/zencart

Doubletree Hotel AustinHOTEL LOCATION--All ULTRAPURE WATER--Micro activities are held at the Hilton Hotel-Mesa (Phoenix), Arizona. For your convenience, we recommend that you stay at this hotel for the duration of the conference. The Hilton is located at 1011 West Holmes Avenue Mesa, Arizona, USA, 85210.  Phone: 1-480-833-5555, just 3.00 miles from city center.  Shuttle service is available from the Phoenix airport.  The hotel also provides free internet access for all conference registrants staying at the hotel.

ROOM RATES-- Single or Double-$149(All rates subject to additional city taxes.)  When making hotel reservations, it is important that you mention the ULTRAPURE WATER Conference. These special rates, as well as a block of rooms, are guaranteed only through October 21, 2010. Don’t miss out — phone in your reservations today at 480-833-5555, or 800-HILTONS. Refer to Tall Oaks Publishing, or Ultrapure Water in order to obtain this special rate. Or, Click Here for hotel online registration. 


Executive Forum

PRELIMINARY PROGRAM: 

• The Future of Cost-Effective UHPW Processing Awaits in the Measurements of the Past
John Morgan, H2Morgan; Charlotte Hill and Gert Burkhardt, Georg Fischer Signet

• Technical Concept, Specifications and Limitations of an On-line Trace Sodium Analyzer
Markus Bernasconi, SWAN Analytische Instrumente AG

• Material Selection in Heat Exchangers for Hot UPW Applications
Michael Pischke, Scot Seifert, and Paul Hagen, Alfa Laval Inc.

• Trace Contaminant Removal from Wastewater via an Adsorption Process
James J. Pardini PE, CPE, MEL Chemicals, Inc.

• Next Generation of UPW Distribution System for the Next Generation of Semiconductor Fabs
Slava Libman, Ph.D., M+W U.S. Inc.; Dave Buesser and Brandon Ekberg

• Development of Guide for Ultrapure Water Used in Semiconductor Processing
Slava Libman, Ph.D., M+W U.S., Inc.; Marty Burkhart, Hi Pure Tech Inc.

• Integrating the Cooling Tower into a Fab’s Water Conservation Strategy
Barry Carroll, Brian Jenkins, and John Schellerberg, Nalco Co.

• High Efficiency RO: Applying the Next Generation Steps
David O’Connor, Allen Boyce, and Patrick Reynolds, Intel

• Reclamation of Copper-CMP Wastewater
David Hubler, James C. Baygents, and James Farrell, University of Arizona

• lnnovative Presentation Techniques for Process Quality Data and Data Quality of UPW Water Systems
John Morgan, H2Morgan; Greg Carr, TBD; Robert Mclntosh, Solar World

• Thermoplastic Welder Qualification Standards
Ted Hutton, ARKEMA Inc.

• TOC Measurement Standards and the Impact of Nano/Microfabrication
Tim Miller, Purdue University

• Particle Control in UPW through the Use of Filtration Validated for Removal Performance
Barry Gotlinsky, Ph.D., Pall Corp.
 
• Use of Modeling in Predicting Impurity Removal and System Behavior in EDI for Process Applications
Azita Yazdani and José Chavez, Exergy Technologies Corp.

• ITRS Update
Jeff Chapman, IBM

• ITRS Roundtable Discussion
* TABLETOP EXHIBITS--Exhibit hours:  Tuesday: 1:00PM-7:00PM; Wednesday: 11:00AM–3:00PM.  Click here for an Exhibitor's prospectus.

2009 Exhibitors:
l AHLSTROM FILTRATION INC. l AIR LIQUIDE-BALAZS NANOANALYSIS l AQUAFINE l ARKEMA l ASAHI AMERICA INC. l CHRIST WATER TECHNOLOGY l FLUID MEASUREMENT TECHNOLOGIES l GENESYS NORTH AMERICA l HEATEFLEX l HYDRANAUTICS l IN USA l METTLER TOLEDO THORNTON l OZONE SYSTEMS & TECHNOLOGY l PROMINENT FLUID CONTROLS l SIEMENS WATER TECHNOLOGIES l SWAN ANALYTICAL INSTRUMENTS l THE PUROLITE COMPANY 
Cancellations/refunds
Refunds cannot be granted on cancellations received after November 12, 2010. Cancellations prior to this date are allowed without penalty. There will be a $30 processing fee on all refunds. If you need to change your plans to attend, you may transfer your registration to another person at any time without incurring any penalty.

For Further Information Contact:
TALL OAKS PUBLISHING INC.
Phone / Fax: 303-973-6700 (U.S.A.)

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ULTRAPURE WATER®  is a registered trademark of Tall Oaks Publishing Inc.