|
|||||||
Ultrapure
Water-Micro 2010 Conference |
|||||||
![]()
Conference on Electronics Water
ULTRAPURE WATER--Micro is
a two-day conference on Microelectronics Pure Water offering an Executive Forum
consisting of state-of-the-art technical papers and
Table-Top exhibits. Typical attendance is 130 individuals, mostly from the
microelectronics industries. Click
Here for a registration form, or register online at:
www.ultrapurewater.com/Zencart. |
|||||||
| Proceedings of past conferences are available for purchase at: www.talloaks.com/zencart | |||||||
|
|
ROOM RATES-- Single or Double-$149(All rates subject to additional city taxes.) When making hotel reservations, it is important that you mention the ULTRAPURE WATER Conference. These special rates, as well as a block of rooms, are guaranteed only through October 21, 2010. Don’t miss out — phone in your reservations today at 480-833-5555, or 800-HILTONS. Refer to Tall Oaks Publishing, or Ultrapure Water in order to obtain this special rate. Or, Click Here for hotel online registration. |
||||||
|
PRELIMINARY PROGRAM: • The Future of Cost-Effective UHPW Processing Awaits in the Measurements of the PastJohn Morgan, H2Morgan; Charlotte Hill and Gert Burkhardt, Georg Fischer Signet • Technical Concept, Specifications and Limitations of an On-line Trace Sodium Analyzer Markus Bernasconi, SWAN Analytische Instrumente AG • Material Selection in Heat Exchangers for Hot UPW Applications Michael Pischke, Scot Seifert, and Paul Hagen, Alfa Laval Inc. • Trace Contaminant Removal from Wastewater via an Adsorption Process James J. Pardini PE, CPE, MEL Chemicals, Inc. • Next Generation of UPW Distribution System for the Next Generation of Semiconductor Fabs Slava Libman, Ph.D., M+W U.S. Inc.; Dave Buesser and Brandon Ekberg • Development of Guide for Ultrapure Water Used in Semiconductor Processing Slava Libman, Ph.D., M+W U.S., Inc.; Marty Burkhart, Hi Pure Tech Inc. • Integrating the Cooling Tower into a Fab’s Water Conservation Strategy Barry Carroll, Brian Jenkins, and John Schellerberg, Nalco Co. • High Efficiency RO: Applying the Next Generation Steps David O’Connor, Allen Boyce, and Patrick Reynolds, Intel • Reclamation of Copper-CMP Wastewater David Hubler, James C. Baygents, and James Farrell, University of Arizona • lnnovative Presentation Techniques for Process Quality Data and Data Quality of UPW Water Systems John Morgan, H2Morgan; Greg Carr, TBD; Robert Mclntosh, Solar World • Thermoplastic Welder Qualification Standards Ted Hutton, ARKEMA Inc. • TOC Measurement Standards and the Impact of Nano/Microfabrication Tim Miller, Purdue University • Particle Control in UPW through the Use of Filtration Validated for Removal Performance Barry Gotlinsky, Ph.D., Pall Corp. • Use of Modeling in Predicting Impurity Removal and System Behavior in EDI for Process Applications Azita Yazdani and José Chavez, Exergy Technologies Corp. • ITRS Update Jeff Chapman, IBM • ITRS Roundtable Discussion |
|||||||
|
2009 Exhibitors: l AHLSTROM FILTRATION INC. l AIR LIQUIDE-BALAZS NANOANALYSIS l AQUAFINE l ARKEMA l ASAHI AMERICA INC. l CHRIST WATER TECHNOLOGY l FLUID MEASUREMENT TECHNOLOGIES l GENESYS NORTH AMERICA l HEATEFLEX l HYDRANAUTICS l IN USA l METTLER TOLEDO THORNTON l OZONE SYSTEMS & TECHNOLOGY l PROMINENT FLUID CONTROLS l SIEMENS WATER TECHNOLOGIES l SWAN ANALYTICAL INSTRUMENTS l THE PUROLITE COMPANY |
|||||||
|
Cancellations/refunds Refunds cannot be granted on cancellations received after November 12, 2010. Cancellations prior to this date are allowed without penalty. There will be a $30 processing fee on all refunds. If you need to change your plans to attend, you may transfer your registration to another person at any time without incurring any penalty. |
|||||||
|
For Further Information Contact:
ULTRAPURE WATER® is a registered trademark of Tall Oaks Publishing Inc. |
|||||||