Archive
| Date | Title | Authors | Lead Text |
|---|---|---|---|
| 2015‑09 | Ask the Experts - What Is Process Water? | William Harfst | Editor’s note: Ask the Experts is a regular feature with answers to water treatment questions. On... |
| 2010‑09 | Examining a Photochemical Process for Use in Water Purification | Mark Owen, Tom Hawkins, Ph.D., and Dave Moser | Anumber of technologies are available to remove contaminants in the production of high-purity wat... |
| 2010‑02 | Behavior of Metal Deposition from High-Purity Water During Wafer Rinsing Process | Drew Sinha, Ph.D., Jeff Chapman, and Richard Godec | The impact of metal contamination on semiconductor device yield is well established. Decreasing ... |
| 2009‑11 | Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes | Annie Xia et al. | To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat... |
| 2008‑12 | Water Conservation Using Closed-Loop, Evaporative Systems for Process and Power Applications | Peter G. Demakos, P.E., and Brian Demers | Power generation accounts for a significant amount of fresh water use in the United States. Ther... |
| 2008‑04 | Membrane Process Offers Improved Water Recovery | Hu Fleming, Ph.D., and Riad Al-Samadi, Ph.D. | In the United States, technical and economic challenges associated with the disposal of high-sali... |
| 2007‑10 | Process to purify POU water for immersion lithography | Bipin Parekh | |
| 2007‑06 | RO & DI pretreatment to remove oils and organics and allow for process water reuse | Kirk Abbott & Doug Dittburner | |
| 2005‑11 | Monitoring membrane separation processes in high-purity water application | Jim Elliott & Carl Hickman | |
| 2004‑08 | Water chemistry and the hyperfiltration or reverse osmosis process | Lee Comb | |
| 2004‑06 | Detection and optimization of hydrogen peroxide in processed DI water using ion chromatography | Jason Roethig & George Smith | |
| 2002‑08 | The role of process simulation in evaluating water recycling opportunities at a semiconductor fabrication facility | Demetri Petrides et al. | |
| 2002‑06 | Minimization of water usage for BOE etch processess | Kimberley L. Ogden | |
| 2002‑06 | Ionic and particulate contamination of SPM process rinse waters | Drew Sinha & Henryson Omoregie |
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