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Date | Title | Authors | Lead Text |
---|---|---|---|
2001‑12 | Role of high-purity water in future cleaning of silicon wafer by wet cleaning process | Drew Sinha | |
2001‑03 | An examination of pipe self cleaning in high-purity water systems | Jörg Klauer | |
2000‑09 | Cleaning and scale prevention in reverse osmosis systems | Daniel Comstock | |
2000‑09 | Process considerations and source reduction opportunities for high-purity water in wet cleaning of silicon wafer | Drew Sinha | |
1999‑06 | The use of high-purity water in the wafer-cleaning process | Drew Sinha | |
1998‑10 | Membrane technologies in precision cleaning applications | Peter Cartwright | |
1994‑10 | Obstacles to the effective chemical cleaning of a reverse osmosis unit | David H. Paul | |
1994‑06 | New high-purity water cleaning process for tubing used in semiconductor clean-room piping | Johnny Osborne & Jeff Meyers |
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