Archive



Table Tiles

Date Title Authors Lead Text
2011‑01 Part 1: Highlights of Presentations at ULTRAPURE WATER Pharma 2010 Mike Henley ULTRAPURE WATER Pharma 2010, conducted here May 20-21, focused on key topics for successful pharm...
2010‑03 Pharmaceutical Water Treatment David Paul T his edition of Ultrapure Water is devoted to pharmaceutical water treatment. This Back To Basi...
2009‑11 Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes Annie Xia et al. To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat...
2008‑11 Is Cation Conductivity Monitoring Relevant For Todayï¾’s Combined Cycle Power Plant? Luis Carvalho, P.E., Thomas James, and William E. Hunter The PowerSmith Cogeneration facility is a 120-megawatt (MW) combined cycle, cogeneration plant lo...
2008‑10 A Way to Optimize Cation/Anion Resin Replacement Frequency Ted Chiu et al. T he traditional approach for determining replacement of cation/anion resins in the pretreatment c
2008‑10 Achieving Ultra-Low-Level Measurement of Anions and Cations in Semiconductor High-Purity Water S.M. Rahmat Ullah et al. ilica, trace metals, total organic carbon (TOC), particles, anions and cations are monitored on a r
2008‑09 Removal Of Cu (II) From An Aqueous Solution And Environmental Samples Using Strong Cationic Resin Fathi K. Awad ere reported especially of new sorbents based on reversed phase silica gels. Cationic exchangers w
2005‑10 Recycling high-purity rinsewater at Samsung Austin Semiconductor Chris Thompson & edward Lickteig
2005‑06 Key cycle chemistry measurements_Conductivity and pH David M. Gray
2004‑03 Quality verification program for on-line chemistry instruments Stephen J. Shulder & Grace Counts-Smith
2004‑03 Calibration of resistivity measurements in the semiconductor industry Anthony C. Bevilacqua et al.
2003‑02 Advances in instrumentation used to monitor high-purity water treatment systems David M. Gray
2002‑10 A theoretical approach to measuring pH and conductivity in high-purity water Carine Nora et al.
2001‑02 Resistivity instruments to meet semiconductor processing requirements Victor M. Braga

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