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Table Tiles

Date Title Authors Lead Text
2017‑11 Why Deposit Control Polymer Selection Impacts Stressed Cooling Water System Phosphate-Based Treatment Program Performance Dr. Libardo A. Perez, Dr. Zahid Amjad, Robert W. Zuhl Phosphate-based cooling water treatment programs are widely used to prevent corrosion on low-carb...
2016‑05 What Approach Most Accurately Measures and Characterizes 10-nm Or Larger Particles In Semiconductor Water? Murayama et al. “Killer” particles in ultrapure water (UPW*) are very fine particles that are a cause of low y
2015‑10 How Do Particle Concentration and Face Velocity Impact the Removal of Sub-100-nm Particles from High-Purity Water? Grant, Beuscher &amp; van Schooneveld anometers (nm) and it is expected to decrease to < 10 nm by 2017 (1). Particles approximately half t
2015‑04 What is a Particle Bernie Zerfas A particle in water is often considered to be a minute portion or fragment of something else, for e
2015‑02 The Water Engineer's Perspective on the Road to Particle Filtration Bernie Zerfas et al. Particle measurement in deionized and ultrapure water (UPW*) systems has always been c
2014‑06 Advances in Semiconductor Devices Drives Demand For Particle Measurement at Smaller Sizes Mike Henley ore sensitive liquid particle monitoring instruments to ensure that high-purity water used by the m
2014‑03 Part 8: Bio- (green) and Synthetic Polymers as Antiscalants and Dispersants Zahid Amjad, Ph.D. The formation of scale-forming salts or mineral scales in boiler, cooling towers, reverse osmosis...
2013‑08 Removal of Particles in Semiconductor Manufacturing Aapo Sääsk A new membrane distillation (MD) technology has the potential to create a total barrier for all particle
2013‑06 Minimizing Particle and Metal Ion Contamination on Fluid Control Components ヨ UPDATE Ed Cellucci et al. ith corresponding critical particle size reduction to 18 nm, and critical metal ions from 1,000 p
2012‑06 Removal of 12-nm Particles from High-Purity Water by a Combination of Ultrafiltration and Microfiltration Donald C. Grant, Dennis Chilcote, Ph.D., and Uwe Beuscher, Ph.D. anometer (nm) and expected to decrease to < 20 nm by 2015 (1). Particles on the order of half this f
2012‑06 Minimizing Particle and Metal Ion Contamination on Fluid Control Components Ed Cellucci, and Greg Michalchuk evels of metal ion contamination and particle shedding, all negatively affecting chip yields in m
2011‑11 Enhanced USP 788 Sub-Visible Particle Analysis Using Fluid Imaging Microscopy Thomas M. Canty, P.E. and Paul J. OメBrien xample, is critical in protecting the patient from side effects that these particles can cause. Particle
2011‑09 Part 7: Influence of Rust Particles on the Performance of Inhibitors Zahid Amjad, Ph.D., and Dominique Guyton The formation and adherence of scale-forming minerals on equipment surfaces continues to present ...
2011‑03 Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in UPW Slava Libman et al. This article describes the current state of particle detection technology in ultrapure water (U

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