Archive
Date | Title | Authors | Lead Text |
---|---|---|---|
2010‑11 | Phosphorous Contamination from Ultrapure Water in Wet Cleaning of Silicon Wafers | Drew Sinha et al. | Phosphorous is one of the most commonly used N-type dopant for the manufacturing of semiconductor... |
2006‑11 | Behaviour of metal contamination of the silicon wafer from SC1 solution in the wet-cleaning process | Drew Sinha | |
2004‑06 | Reduction of process and material-induced surface defect from wet cleaning silicon wafers | Drew Sinha | |
2003‑02 | Control and reduction of particulate contamination of silicon wafer by wet cleaning process | Drew Sinha | |
2001‑12 | Role of high-purity water in future cleaning of silicon wafer by wet cleaning process | Drew Sinha | |
2000‑09 | Process considerations and source reduction opportunities for high-purity water in wet cleaning of silicon wafer | Drew Sinha |
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