Archive

December 2005

Removal of dissolved oxygen from high-purity water_Much ADO about nothing

By John H. Rydzewski

Disinfection plays important role in water treatment

By Mike Henley

August 2005

A progress report on the direct application of imidodiacetic-functional IX resin in Cu CMP waste treatment

By Phil Fatula & Bruno Hees

June 2004

Reduction of process and material-induced surface defect from wet cleaning silicon wafers

By Drew Sinha

December 2003

Recent trends in design and installation of high-purity water plants and distribution systems

By Srinivas Kasilanka & Andreas Neuber

June 2003

The analysis of boron, colloidal silica, and dissolved silica leakage from primary regenerable mixed IX beds

By Ed Johnson et al.

February 2003

Major challenges in the development of photocatalytic reactor for water purification

By Ajay K. Ray

December 2002

Rapid detection of viable bacteria in high-purity water in the microelectronic industry

By Barbara Stanczyk et al.

November 2002

Part 1: Flow requirements, pressure differential, and pressure control of distribution systems

By David S. Buesser

September 2002

Reclaimed water for producing 18-MEGOHM-CM DI water for printed circuit board Manufacturing

By Mahadevappa B. Yeligar & Jim Harris

February 2002

Photolytic destruction of TOC in spent rinse waters by H2O2 and UV radiation

By Robert P. Donovan

September 2001

Part 2: Impact of caustic dosing on contaminant removal using double-pass RO

By Avijit Dey et al.

August 2001

Part 1: Effect of interstage caustic dosing on the silica, boron, and organic removal using double-pass RO

By Avijit Dey et al.

June 2000

Conceptual design for CMP wastewater recycle

By Jack Martyak & Steven R. Gagnon