Archive


Table Tiles

August 2017

Example of a contemporary type of EDI system. Photo courtesy of QUA Group.

Back to Basics

How Has EDI Technology Changed Since 1987?

By Fred Wiesler

April 2017

Photo courtesy of Evoqua Water Technologies LLC. VANOX is a trademark of Evoqua its subsidiaries and affiliates in some countries.

Microelectronics

Can Advanced Oxidation Technology Help Control TOC In Semiconductor Water?

By Glen Sundstrom et al.

February 2017

Briefing

An Overview Of UPW Users: Treatment Technologies and Purified Water Applications

By Mike Henley

January 2017

Microelectronics

R&D Patent Trends 1992-2002: The evolving distribution of technical approaches to UPW for Microelectronics

By Michael Bigwood, PhD

December 2016

Deionization

Use of EDI Technology To Recycle HF Acid Wastes from Scrubbers and Thermal Treatment Units

By Chris P. Jones, Ph.D. Adrienne Pierce, and Benjamin R. Roberts, Ph.D.

Technology Development

Use Of A New Online Elemental Instrument For UPW Analysis Through An X-ray Fluorescence-based Approach

By Krag Peterson et al.

October 2016

LinkedIn Discussion

What is the value in measuring conductivity in a UPW system?

Compiled by Mike Henley and James McDonald

Organics

A Method To Predict A Potential TOC Incursion From A Municipal Water Source

By Paul Tan, W.T. Huang, and C.H.Chiuwas

September 2016

Cooling

Can A Bromine Alternative Improve Cooling Water Microbial Control?

By Andrew Boal

LinkedIn Discussion

What are the Advantages to Different Filtration Technologies?

Compiled by Mike Henley and James McDonald

Membranes

Can Advanced Polymer Technology Be Effective For RO Scale Prevention and Control?

By Jonathan Hays & Kelle Zeiher

Ultraviolet

UV-Induced Polytetrafluoroethylene Degradation as a Source of Particulate Contamination in Pure Water Systems

By Michael Green and Timothy Strodtbeck

Microelectronics

An Approach for Copper and Hydrogen Peroxide Removal from Copper CMP and Solar Cell Wastewater

By Wismer et al.

August 2016

Technology Trends

Achieving IPA Removal In UPW From Marangoni Dryers In Semiconductor Production

By Yazdani et al.

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