Archive


Table Tiles

August 2017

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Example of a contemporary type of EDI system. Photo courtesy of QUA Group.

Back to Basics

How Has EDI Technology Changed Since 1987?

By Fred Wiesler

April 2017

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Photo courtesy of Evoqua Water Technologies LLC. VANOX is a trademark of Evoqua its subsidiaries and affiliates in some countries.

Microelectronics

Can Advanced Oxidation Technology Help Control TOC In Semiconductor Water?

By Glen Sundstrom et al.

February 2017

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Briefing

An Overview Of UPW Users: Treatment Technologies and Purified Water Applications

By Mike Henley

January 2017

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Microelectronics

R&D Patent Trends 1992-2002: The evolving distribution of technical approaches to UPW for Microelectronics

By Michael Bigwood, PhD

December 2016

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Deionization

Use of EDI Technology To Recycle HF Acid Wastes from Scrubbers and Thermal Treatment Units

By Chris P. Jones, Ph.D. Adrienne Pierce, and Benjamin R. Roberts, Ph.D.
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Technology Development

Use Of A New Online Elemental Instrument For UPW Analysis Through An X-ray Fluorescence-based Approach

By Krag Peterson et al.

October 2016

LinkedIn Discussion

What is the value in measuring conductivity in a UPW system?

Compiled by Mike Henley and James McDonald
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Organics

A Method To Predict A Potential TOC Incursion From A Municipal Water Source

By Paul Tan, W.T. Huang, and C.H.Chiuwas

September 2016

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Cooling

Can A Bromine Alternative Improve Cooling Water Microbial Control?

By Andrew Boal

LinkedIn Discussion

What are the Advantages to Different Filtration Technologies?

Compiled by Mike Henley and James McDonald
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Membranes

Can Advanced Polymer Technology Be Effective For RO Scale Prevention and Control?

By Jonathan Hays & Kelle Zeiher
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Ultraviolet

UV-Induced Polytetrafluoroethylene Degradation as a Source of Particulate Contamination in Pure Water Systems

By Michael Green and Timothy Strodtbeck
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Microelectronics

An Approach for Copper and Hydrogen Peroxide Removal from Copper CMP and Solar Cell Wastewater

By Wismer et al.

August 2016

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Technology Trends

Achieving IPA Removal In UPW From Marangoni Dryers In Semiconductor Production

By Yazdani et al.

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