Archive



Table Tiles

Date Title Authors Lead Text
2010‑01 A Review of Challenges and Opportunities Facing the Water Business Steve Maxwell The water industry is a disparate business. Although we casually talk about the モwater industry,ヤ...
2009‑12 Part 2: Effect of System Impurities on Gypsum Control Zahid Amjad, Ph.D. The deposition of mineral deposits of calcium containing salts on heat exchangers and reverse osm...
2009‑12 Part 1: Emerging Water Chemistry Issues in Combustion Turbine Evaporative Coolers Daniel J. Robinette, P.E., and Charlie Nichols, P.E. Evaporative coolers are used extensively in the power industry to increase power output from comb...
2009‑12 An Overview of Power Generation Water Treatment David Paul This edition of Ultrapure Water is devoted to power generation water treatment. This Back to Bas...
2009‑12 MF and RO: A Useful Combination for Plant Make-up Water Treatment Brad Buecker As the later discussion on RO illustrates, removal of suspended solids from RO feed is absolutely...
2009‑11 Part 1: Major Components that Make Up the Water Business Mike Henley Water. Where is the market going, and what opportunities lie in this most important industry tha...
2009‑11 Important Considerations for Implementing Laboratory Water Standards Jamie Grossi The non-regulated laboratory environment has long been an overlooked aspect of the water purifica...
2009‑11 Damage to RO Membranes by the Overuse of Ion-Exchange Resin Cleaning Chemicals in Pretreatment Softeners Timothy J. Miller In October 2005, Purdue University opened the Birck Nanotechnology Center (BNC). Providing offic...
2009‑11 Transient Boron Leakage in a Semiconductor Water System Lindsey Stahl & Jeff Chapman The presence of boron in ultrapure water (UPW*) for semiconductors has until recently been monito...
2009‑11 Measurement of Sub-50-nm Particle Retention by UPW Filters Don Grant & Uwe Beuscher The critical features size of state-of-the-art semiconductor devices is on the order of 50 nanome...
2009‑11 Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes Annie Xia et al. To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat...
2009‑10 Use of an Iron-Specific Resin For the Removal of Iron from Groundwater Renu Saraf Iron is a common metallic element found in nature. Water percolating through soil and rocks disso...
2009‑10 Part 5: Other Reports on Promising Nanotechnology Treatments for Water Treatment Mike Henley An alternative. As we push toward 2010, nanotechnology is revolutionizing traditional technologi...
2009‑10 Effect of Polymers for Gypsum Scale Control in Industrial Water Systems Zahid Amjad, Ph.D. Scaling of heat exchangers, reverse osmosis (RO) membrane, and equipment surfaces by carbonates, ...

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