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Date Title Authors Lead Text
2016‑07 Patent Summaries: Evoqua investigate a method to irradiate a liquid; Kurita Cleaning and sterilizing method for UPW manufacturing system Mike Henley Method to irradiate a liquid Inventor: Bruce Lee Coulter Assignee: Evoqua Water Technologies, L...
2016‑02 Proper Installation And Cleaning Practices For pH Sensors Frederick J. Kohlmann pH is one of several parameters measured in high-purity and industrial water and wastewater treat...
2015‑07 Innovations in Membrane Cleaning Stephen P. Chesters and Matthew W. Armstrong Reverse osmosis (RO) membrane cleaning is essential for efficient plant operation and yet there h...
2014‑06 Hydrogen Damage Mitigation by Boiler Chemical Cleaning Andrew G. Howell, Ph.D. Boiler tube failures resulting from hydrogen damage are characterized by corrosion beneath locall...
2012‑10 Recovery of RO Membrane Performance through Direct Osmosis-High Salinity Membrane Cleaning Process Harold Standfield et al. The water treatment plant at Ameren Energy ResourcesοΎ’ Newton Energy Center was constructed and co...
2012‑06 Cleaning Reverse Osmosis Membranes William F. Harfst In the 1960s, the first reverse osmosis (RO) membrane was developed for the removal of dissolved ...
2010‑11 Phosphorous Contamination from Ultrapure Water in Wet Cleaning of Silicon Wafers Drew Sinha et al. Phosphorous is one of the most commonly used N-type dopant for the manufacturing of semiconductor...
2010‑05 Part 1: Reducing the Total Costs of Operation--The Art of Membrane Cleaning Jantje Johnson Most areverse osmosis (RO) systems will experience performance problems during their operating li...
2009‑11 Damage to RO Membranes by the Overuse of Ion-Exchange Resin Cleaning Chemicals in Pretreatment Softeners Timothy J. Miller In October 2005, Purdue University opened the Birck Nanotechnology Center (BNC). Providing offic...
2009‑11 Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes Annie Xia et al. To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat...
2006‑11 Behaviour of metal contamination of the silicon wafer from SC1 solution in the wet-cleaning process Drew Sinha
2004‑06 Reduction of process and material-induced surface defect from wet cleaning silicon wafers Drew Sinha
2004‑04 Membrane cleaning_The advantages of off-site cleaning of RO membranes Jeffery Peters et al.
2003‑02 Control and reduction of particulate contamination of silicon wafer by wet cleaning process Drew Sinha

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