Archive
| Date | Title | Authors | Lead Text |
|---|---|---|---|
| 2016‑07 | Patent Summaries: Evoqua investigate a method to irradiate a liquid; Kurita Cleaning and sterilizing method for UPW manufacturing system | Mike Henley | Method to irradiate a liquid Inventor: Bruce Lee Coulter Assignee: Evoqua Water Technologies, L... |
| 2016‑02 | Proper Installation And Cleaning Practices For pH Sensors | Frederick J. Kohlmann | pH is one of several parameters measured in high-purity and industrial water and wastewater treat... |
| 2015‑07 | Innovations in Membrane Cleaning | Stephen P. Chesters and Matthew W. Armstrong | Reverse osmosis (RO) membrane cleaning is essential for efficient plant operation and yet there h... |
| 2014‑06 | Hydrogen Damage Mitigation by Boiler Chemical Cleaning | Andrew G. Howell, Ph.D. | Boiler tube failures resulting from hydrogen damage are characterized by corrosion beneath locall... |
| 2012‑10 | Recovery of RO Membrane Performance through Direct Osmosis-High Salinity Membrane Cleaning Process | Harold Standfield et al. | The water treatment plant at Ameren Energy Resourcesﾒ Newton Energy Center was constructed and co... |
| 2012‑06 | Cleaning Reverse Osmosis Membranes | William F. Harfst | In the 1960s, the first reverse osmosis (RO) membrane was developed for the removal of dissolved ... |
| 2010‑11 | Phosphorous Contamination from Ultrapure Water in Wet Cleaning of Silicon Wafers | Drew Sinha et al. | Phosphorous is one of the most commonly used N-type dopant for the manufacturing of semiconductor... |
| 2010‑05 | Part 1: Reducing the Total Costs of Operation--The Art of Membrane Cleaning | Jantje Johnson | Most areverse osmosis (RO) systems will experience performance problems during their operating li... |
| 2009‑11 | Damage to RO Membranes by the Overuse of Ion-Exchange Resin Cleaning Chemicals in Pretreatment Softeners | Timothy J. Miller | In October 2005, Purdue University opened the Birck Nanotechnology Center (BNC). Providing offic... |
| 2009‑11 | Controlled Di Water Gasification System For Advanced Semiconductor Cleaning Processes | Annie Xia et al. | To meet the cleaning requirements for wafers with features below 65-nanometers (nm) or incorporat... |
| 2006‑11 | Behaviour of metal contamination of the silicon wafer from SC1 solution in the wet-cleaning process | Drew Sinha | |
| 2004‑06 | Reduction of process and material-induced surface defect from wet cleaning silicon wafers | Drew Sinha | |
| 2004‑04 | Membrane cleaning_The advantages of off-site cleaning of RO membranes | Jeffery Peters et al. | |
| 2003‑02 | Control and reduction of particulate contamination of silicon wafer by wet cleaning process | Drew Sinha |
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