Archive
Date | Title | Authors | Lead Text |
---|---|---|---|
2014‑06 | Inhibition of Copper Corrosion by Removal of H2O2 from UPW Using Noble Metal Catalysts | Daisaku Yano et al. | Ultrapure water used in a semiconductor factory contains 10 to 40 micrograms per liter of hydroge... |
2007‑10 | Removal of organic compounds through wet oxidation of ethanol with H2O2 on a supported Mn0x catalyst | Kanaparthi Ramesh et al. | |
2004‑06 | H2O2 decontamination and improving manufacturing productivity through high-purity water bacteria elimination | Anthony J. Archuleta et al. | |
2002‑02 | Photolytic destruction of TOC in spent rinse waters by H2O2 and UV radiation | Robert P. Donovan | |
2000‑03 | Problems of trace H2O2 on ion-exchange resins in high-purity water production | Dirk M. Pfenning |
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