Inhibition of Copper Corrosion by Removal of H2O2 from UPW Using Noble Metal Catalysts

By Daisaku Yano et al.

Copper Corrosion H2O2

Download Full Article


Ultrapure water used in a semiconductor factory contains 10 to 40 micrograms per liter of hydrogen peroxide (H2O2). Through oxidation, organic impurities in UPW are decomposed by ultraviolet (UV) irradiation in a UPW polishing system. Hydroxyl radicals generated by UV light of a wavelength around 185 nanometer attack organics, but some of them combine each other to produce H2O2. The polishing system usually has a circulation loop, so H2O2 is accumulated. Copper corrosion can become a concern.

Log in or Subscribe to Access the Full Article

To read or download full-length articles you need a subscription to Ultrapure. Please log in or subscribe below.