High-Purity

Trace Urea Removal Technology for High-Purity Water Quality Improvement

By Nobukazu Arai et al.

Urea Purification Total Organic Carbon (TOC) Monitoring

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Abstract

Semiconductor-grade watera is used as a rinse water in the manufacturing process of electronic devices. Further reductions of impurities are required in semiconductor manufacturing processes because of the more precise LSI manufacturing process. For example, a total organic carbon (TOC) level of 1 micrograms per liter (g/L) or less is required for organic impurities. One of the organic compounds of remaining in high-purity water is assumed to be urea. Because urea is a non-ion with low-molecular weight, a small amount of urea in raw water passes through water treatment processes such as ion exchange (IX) and reverse osmosis (RO) in high-purity water production systems. Therefore, urea removal technology is a key to reduce TOC in high-purity water.

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