Archive
| Date | Title | Authors | Lead Text |
|---|---|---|---|
| 2015‑08 | Meeting New Challenges In Power Plant Water Treatment: A Conversation with Andy Howell, Senior System Chemist at Xcel Energy | Mike Henley | Controlling cost and providing power plant water supplies are two challenges faced by the utility... |
| 2014‑01 | Meeting Stringent Mercury and Heavy Metal Discharge Limits | E.H. Kelle Zeiher, Ph.D., Al Foster, and Maurice Smith, Ph.D. | The Federal limit for mercury (Hg) emissions from industrial and municipal sites is set at < 1... |
| 2011‑02 | Part 2: Presentation Overviews from 2010 Pharmaceutical Water Meeting | Mike Henley | ULTRAPURE WATER Pharma 2010, which was held last May, was part of a continuing series of conferen... |
| 2009‑05 | Meeting the ITRS Roadmap Guidelines for Particle Measurements in SEMICONDUCTOR High-Purity Water | Bill Shade | Deionized (DI) water is used throughout electronics manufacturing. In semiconductor manufacturin... |
| 2008‑05 | Emerging Applications of High-Purity Water: Meeting Challenges of Advanced Semiconductor Manufacturing | Bipin Parekh | Wet cleaning processes continue to advance to meet the challenges of manufacturing semiconductor ... |
| 2004‑11 | Part 1: Meeting water requirements for 300-MM FABS | Thomas Fulde |
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