| 2008‑05 |
Emerging Applications of High-Purity Water: Meeting Challenges of Advanced Semiconductor Manufacturing |
Bipin Parekh |
Wet cleaning processes continue to advance to meet the challenges of manufacturing semiconductor ... |
| 2008‑05 |
High-Purity Water Analytical Technology for Sub 50-nm Devices |
Ikunori Yokoi et al. |
Progress in the development of a semiconductor-scaling technology and that of high-performance mi... |
| 2007‑11 |
PPQ analysis of high-purity DI water used in semiconductor FABs |
David Bollinger & Hugh Gotts |
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| 2007‑09 |
Recovery of IX resins regeneration rinses in high-purity water manufacturing plants |
Alessandro Beretta |
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| 2006‑10 |
Use of reynolds number as a criteria for design of high-purity water systems |
Slava Libman |
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| 2006‑04 |
The use of membrane distillation in high-purity water production for the semiconductor industry |
Chuanfeng Liu & Andrew Martin |
|
| 2006‑02 |
Rouging: The phenomenon and its control in high-purity water systems |
Russell D. Kane |
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| 2006‑02 |
Part 1: Advancements in the design and simulation of UV reactors aid chloramines reduction in high-purity water |
Ben Adelstein et al. |
|
| 2005‑12 |
Removal of dissolved oxygen from high-purity water_Much ADO about nothing |
John H. Rydzewski |
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| 2005‑11 |
Monitoring membrane separation processes in high-purity water application |
Jim Elliott & Carl Hickman |
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| 2005‑11 |
Qualifying new raw materials for use in high-purity water system components |
Jeff Hanson et al. |
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| 2005‑10 |
Recycling high-purity rinsewater at Samsung Austin Semiconductor |
Chris Thompson & edward Lickteig |
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| 2005‑08 |
Measurement results of low concentrations of peroxide in a high-purity water system |
Toshikazy Abe et al. |
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| 2004‑12 |
Part 2: Implementation of a high-purity water system in a 300-MM FAB |
Thomas Fulde |
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