Advanced Fluoride Removal for Treating Concentrated Hydrofluoric Mixed-Acid Waste

By Sam Haycraft

HYDROGEN PEROXIDE ION EXCHANGE PRETREATMENT SEMICONDUCTORS WASTEWATER

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Abstract

The objective of the research reported about in this article was to develop a method that would facilitate the ionization, concentration, and removal of fluoride from concentrated (and dilute) hydrofluoric (HF) mixed-acid waste streams that are commonly found in semiconductor fab etching waste. A more efficient calcium precipitation process was desired that would allow HF waste generators to meet tighter fluoride discharge regulations, or to increase the process flow through existing physical/chemical waste treatment equipment. A secondary objective was to create an improved treatment process that would allow concentrated HF waste to be treated on site in order to meet local discharge limits with a limited amount of equipment and time. This concentrated waste is often sent to off site waste treatment facilities due to the complexity of the treatment required using conventional methods.

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