HYDROGEN PEROXIDE ION EXCHANGE PRETREATMENT SEMICONDUCTORS WASTEWATER

Download Full Article

Abstract

The objective of the research reported about in this article was to develop a method that would facilitate the ionization, concentration, and removal of fluoride from concentrated (and dilute) hydrofluoric (HF) mixed-acid waste streams that are commonly found in semiconductor fab etching waste. A more efficient calcium precipitation process was desired that would allow HF waste generators to meet tighter fluoride discharge regulations, or to increase the process flow through existing physical/chemical waste treatment equipment. A secondary objective was to create an improved treatment process that would allow concentrated HF waste to be treated on site in order to meet local discharge limits with a limited amount of equipment and time. This concentrated waste is often sent to off site waste treatment facilities due to the complexity of the treatment required using conventional methods.

Log in or Subscribe to Access the Full Article

To read or download full-length articles you need a subscription to Ultrapure. Please log in or subscribe below.