Archive
| Date | Title | Authors | Lead Text |
|---|---|---|---|
| 2016‑05 | What Approach Most Accurately Measures and Characterizes 10-nm Or Larger Particles In Semiconductor Water? | Murayama et al. | “Killer” particles in ultrapure water (UPW*) are very fine particles that are a cause of low yiel... |
| 2015‑10 | How Do Particle Concentration and Face Velocity Impact the Removal of Sub-100-nm Particles from High-Purity Water? | Grant, Beuscher & van Schooneveld | The critical feature size of state-of-the-art semiconductor devices line widths is < 20 nanome... |
| 2013‑08 | Removal of Particles in Semiconductor Manufacturing | Aapo Sääsk | A new membrane distillation (MD) technology has the potential to create a total barrier for all p... |
| 2012‑06 | Removal of 12-nm Particles from High-Purity Water by a Combination of Ultrafiltration and Microfiltration | Donald C. Grant, Dennis Chilcote, Ph.D., and Uwe Beuscher, Ph.D. | The critical feature size of state-of-the-art semiconductor devices is on the order of 30 nanomet... |
| 2011‑09 | Part 7: Influence of Rust Particles on the Performance of Inhibitors | Zahid Amjad, Ph.D., and Dominique Guyton | The formation and adherence of scale-forming minerals on equipment surfaces continues to present ... |
| 2011‑03 | Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in UPW | Slava Libman et al. | This article describes the current state of particle detection technology in ultrapure water (UPW... |
| 2010‑01 | New Device for the Collection, and Elemental Identification of Sub-50-nm Particles in UPW | David Blackford, Ph.D., Art Ackermann, P.E.,Glen Wildermuth, P.E., and Sarah Schoen, Ph.D. | To successfully manufacture semiconductor devices, particles contaminating ultrapure water (UPW*)... |
| 2009‑05 | Detection of Nano-particles in Semiconductor Water | Slava Libman et al. | The International Technology Roadmap for Semiconductors (ITRS) ultrapure water (UPW*) technical w... |
| 2009‑01 | A Proposal for Measuring 20-nm Particles in High-Purity Water Using a New Technology | David Blackford, Ph.D., and Don Grant | The objective of the International Technology Roadmap for Semiconductors (ITRS) is ﾓto ensure cos... |
| 2007‑11 | Direct microscopy used to measure 0.02 nm particles | Toru Kusano et al. | |
| 2005‑10 | Can low-presure membranes guarantee particles and pathogen removal? | Warren Johnson & Tony McComick | |
| 1992‑06 | Oxidation and removal of organic particles in high-purity water systems using ozone and UV | Robert A. Governal & Farhang Shadman |
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