Archive


Table Tiles

May 2016

Microelectronics

What Approach Most Accurately Measures and Characterizes 10-nm Or Larger Particles In Semiconductor Water?

By Murayama et al.

October 2015

Microelectronics

How Do Particle Concentration and Face Velocity Impact the Removal of Sub-100-nm Particles from High-Purity Water?

By Grant, Beuscher & van Schooneveld

August 2013

Microelectronics

Removal of Particles in Semiconductor Manufacturing

By Aapo Sääsk

June 2012

High-Purity

Removal of 12-nm Particles from High-Purity Water by a Combination of Ultrafiltration and Microfiltration

By Donald C. Grant, Dennis Chilcote, Ph.D., and Uwe Beuscher, Ph.D.

September 2011

Part 7: Influence of Rust Particles on the Performance of Inhibitors

By Zahid Amjad, Ph.D., and Dominique Guyton

March 2011

Microelectronics

Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in UPW

By Slava Libman et al.

January 2010

New Device for the Collection, and Elemental Identification of Sub-50-nm Particles in UPW

By David Blackford, Ph.D., Art Ackermann, P.E.,Glen Wildermuth, P.E., and Sarah Schoen, Ph.D.

May 2009

Microelectronics

Detection of Nano-particles in Semiconductor Water

By Slava Libman et al.

January 2009

High-Purity

A Proposal for Measuring 20-nm Particles in High-Purity Water Using a New Technology

By David Blackford, Ph.D., and Don Grant

November 2007

Direct microscopy used to measure 0.02 nm particles

By Toru Kusano et al.

October 2005

Can low-presure membranes guarantee particles and pathogen removal?

By Warren Johnson & Tony McComick

June 1992

Oxidation and removal of organic particles in high-purity water systems using ozone and UV

By Robert A. Governal & Farhang Shadman

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