What Approach Most Accurately Measures and Characterizes 10-nm Or Larger Particles In Semiconductor Water?
By Murayama et al.
How Do Particle Concentration and Face Velocity Impact the Removal of Sub-100-nm Particles from High-Purity Water?
By Grant, Beuscher & van Schooneveld
Removal of 12-nm Particles from High-Purity Water by a Combination of Ultrafiltration and Microfiltration
By Donald C. Grant, Dennis Chilcote, Ph.D., and Uwe Beuscher, Ph.D.
Part 7: Influence of Rust Particles on the Performance of Inhibitors
By Zahid Amjad, Ph.D., and Dominique Guyton
Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in UPW
By Slava Libman et al.
New Device for the Collection, and Elemental Identification of Sub-50-nm Particles in UPW
By David Blackford, Ph.D., Art Ackermann, P.E.,Glen Wildermuth, P.E., and Sarah Schoen, Ph.D.
A Proposal for Measuring 20-nm Particles in High-Purity Water Using a New Technology
By David Blackford, Ph.D., and Don Grant
Can low-presure membranes guarantee particles and pathogen removal?
By Warren Johnson & Tony McComick
Oxidation and removal of organic particles in high-purity water systems using ozone and UV
By Robert A. Governal & Farhang Shadman