UPW Micro 2015
What Are New Trends In Semiconductor High-purity And Wastewater Treatment?
By Mike Henley
The microelectronics industry continues to evolve with finer line widths and the need for essentially particlefree water. At the same time, the industry faces challenges in conserving and reusing water, and treating growing streams of wastewater generated by from the use of high-purity water for production steps such as CMP, photolithography, and etchant rinsing. UPW Micro 2015 conducted Oct. 27-28, 2015, in Portland, OR, featured keynote addresses, technical presentations on UPW and process water/wastewater, and Roundtable Networking sessions.
PORTLAND, OR—Particles, semiconductor wastewater management, and developments in ITRS guidelines were among the topics addressed at the 2015 Ultrapure Water Micro conference conducted here at the Jantzen Beach Red Lion Hotel Oct. 27-28. The 18th annual conference also featured Roundtable networking discussions and exhibits by key suppliers to the microelectronics industry.
For the first time, the 18th annual conference featured two tracks. Track 1 focused on high-purity semiconductor water, while Track 2 examined treatment issues for post-UPW microelectronics water and wastewater. Conference moderators on the UPW side were Dr. Slava Libman of Air Liquide Balazs NanoAnalysis; Mr. Bernie Zerfas of GLOBALFOUNDRIES; and Mr. Dan Wilcox of Samsung Austin Semiconductor. Track 2 moderators were Mr. Alan Knapp of Evoqua Water Technologies LLC, and Mr. Alan Boyce of BW Design Group.
This article provides a brief look at UPW Micro’s program. Future articles in Ultrapure Water will examine different presentations in more detail.
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